Electron beam lithography on organosilane Self-Assembled Monolayer Resist.
author、title、journal、volulme page、publication year
Tanii,T., Hosaka,T., Miyake, T., Ohdomari,I. “Electron beam lithography on organosilane Self-Assembled Monolayer Resist.” Japanese Journal of Applied Physics, 43, 4396–4397, 2004.
journal URL
https://iopscience.iop.org/article/10.1143/JJAP.43.4396/meta